摘要
本文介绍了用PECVD技术淀积NO_x敏感的工艺,并对典型工艺参数条件进行了讨论。我们淀积的这种NO_x敏感膜,不仅在旁热情况下对NO_x敏感,而且在室温条件下也能对NO_x气体敏感。最后,我们对室温NO_x气体传感器的一些重要性能指标进行了研究。
The NO_xsensitive thin-film grown by PECVD technique is introduced in this paper, The correlations between the properties of the thin films and their tipical deposition conditions have been investigated. The thin-film is not only sensitive to NO_xgases during heating, but also sensitive to NO_xgases in room-temperature. Finally, we determinated the eharaeteristes of the time reponse and restoring for NO_xgas sensors in room temperature.
