摘要
本文推导了金属 /绝缘体场致发射电流密度公式 ,并应用于金刚石 /碳薄膜场致发射 ,对其现象获得较好的解释 ,同时指出了提高发射电流密度的因素和相应方法。
In this article, we get the function of the field emission current density from the “metal/insulator”. And it is successful in using it to explain the field-emission characters of the diamond/carbon film. At the same time, we find out the relative factors and ways in improving the emission current density.
出处
《光电子技术》
CAS
2001年第2期125-128,共4页
Optoelectronic Technology
