蚀刻衍射光栅设计的一点法与二点法

1-Stigma and 2-Stigma Method for the Design of Etched Diffraction Grating

本文介绍了蚀刻衍射光栅 (EDG)的解复用特性 ,对于光栅几何参数的设计 ,传统的等距凹面光栅不适用于平面波导 ,文中详细的讨论了两种无像差点设计方法 :一点法和两点法。对于两种方法确定的光栅点 ,文中用光程误差进行评价 ,模拟结果显示 。

In this paper a brief introduction of Etching diffraction grating (EDG) demultiplexing characteristic is presented.The traditional constant spacing design of the EDG parameters is not suitable for the planar waveguide.Two design schemes:1 stigma method and 2 stigma method,is analyzed in detail in this paper.The grating points determined respectively by the two methods are evaluated by the light path error.The simulating results show that the grating structure designed by 2 stigma method is better than that by 1 stigma method.