摘要
本文综述了近十几年来CVD技术在不同基底材料上制取含硅化合物膜层的研究应用 。
The applications of the chemical vapor deposition(CVD) in fabrication of silicidized films on various substrates were reviewed in this paper.The theoretical and practical problems in this field were also discussed.\;
出处
《材料科学与工程》
CSCD
北大核心
2001年第2期128-131,共4页
Materials Science and Engineering
基金
浙江省自然科学基金资助项目 !(5 990 67)
