摘要
离子辅助淀积技术对于改进光学薄膜的性质、改善薄膜的微结构、应力状态与表面形貌具有良好效果,从而得到许多具有新机能的薄膜。本文讲述丁离子辅助镀膜的实验装置,说明了使用此工艺镀制ZrO_2,薄膜样品的参数,并给出了光学特性测量、牢固度测量、表面形貌与划痕的实验结果。
Ion aided deposition (IAD) technique is a newly developed vacunm film conting technique Many research results show that IAD technique has good result in the improvement of film character, film micrdstructure, stress state and surface state. From this, we can get many film with new function. This paper presents the experimental apparatus of IAD, explains the parameter of ZrO_2 film example by means of Such a technique and gives the measurement of optical property and firmnesa and the experimental result of surface state and scratch.
出处
《激光与红外》
CAS
CSCD
北大核心
1991年第5期1-6,共6页
Laser & Infrared
关键词
光学薄膜
离子辅助镀膜
薄膜
制备
ion aided deposition (IAD), fabrication of thin films