镀膜技术的最新发展——光学薄膜低压反应离子镀

The Latest Development for Optical Coating Technique——Low Voltage Reactive Ion Plating Deposition

光学薄膜低压反应离子镀技术是近年来镀膜技术领域中的最新进展,在原理上完全不同于以往曾广泛研究的离子辅助镀膜技术,更以其能制备出聚集密度更高、光机性能更稳定、更加坚硬牢固、无柱状结构的薄膜受到国际薄膜光学界的高度重视。本文简析了低压反应离子镀技术的成膜过程和低电压大电流等离子体源的工作机理,概述了该技术发展的历程以及已取得的主要成果,介绍了该技术现存的主要问题和我国已开展的研究项目。

Lew-voltage reactive ion plating deposition (RIPD), a new optical coating technique, is quite different from the ion-assisted deposition in principle. The improvement has been made in density, stability, hardness, adherence, abrasion resistance of thin films without columnar mierostructure produced by the RIPD. Deposition process of RIPD and working principle of low-voltage, large-current plasma source are analysed. Several stages of ion plating and the key results are reviewed.