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中性水溶液中碳钢钝化膜的光电响应 被引量：1

Photoelectrochemical Study of Passive Films Formed on Carbon Steel in Neutral Aqueous Solutions
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摘要 用光电响应方法测量了 pH =8.4的硼砂 -硼酸缓冲溶液中碳钢电极上钝化膜的光电化学行为 .通过研究光响应电流iph与入射光能量hυ(波长λ)和外加扫描电位U的关系 ,指出碳钢电极在中性溶液中形成的钝化膜具有n型半导体的性质 .半导体特征参数 (禁带能量Eg 和平带电位Ufb)表明 ,钝化膜为晶形和无定形 (主要为无定形 )γ -Fe2 O3 组成的无序结构 ,其禁带能量为 2 .0 1eV(晶形 )和 2 .34eV(无定形 ) ,平带电位为 - 0 .10V ,这和钝化膜的X射线衍射 (XRD)实验结果一致 . The photoelectrochemical behavior of passive film formed on carbon steel in neutral borax buffer solution was studied by using photocurrent response method.The presence of negative photocurrent response under the illumination of certain incidence light indicates that the passive film formed on carbon steel has the characteristics of n type semiconductor,which was proved to be mainly composed of amorphous γ Fe 2O 3 through XRD and the identification of its two parameters of semiconductor's characteristics:band gap E g, 2.34 eV,and flat potential U fb ,-0.10 V.Furthermaore,a relationship formula between the photocurrent and the potential applied on the amorphous semiconductor is also deduced.
作者 吴斌 王建信 李义久 倪亚明
机构地区 同济大学污染控制与资源化研究国家重点实验室
出处 《同济大学学报（自然科学版）》 EI CAS CSCD 北大核心 2001年第5期602-606,共5页 Journal of Tongji University:Natural Science
关键词 碳钢电极 钝化膜 光电响应 禁带能量 平带电位 中性水溶液 carbon steel passive film photocurrent response semiconductor band gap flat potential
分类号 TG17 [金属学及工艺—金属表面处理]
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参考文献12

  • 1[1]O'gray W E. Mossbauer study of the passive oxide film on iron[J]. J Electrochem Soc, 1980,127(3) :555 - 563.
  • 2[2]Cohen M. Thin oxide films on iron[J]. J Electrochem Soc, 1974,121 (6): 191c - 197c.
  • 3[3]Revie R W, Baker B G, Bockris J O' M. The passive film on iron: An application of Auger electron spectrosopy[J]. J Electrochem Soc, 1975,122(11): 1460- 1466.
  • 4[4]Kuroda K, Cahan B D, Nazri Gh, el al. Electron diffraction study of the passive film on iron [J ]. J Electrochem Soc, 1982,129 (10) :2163 -2165.
  • 5[5]Searson P C, C atanision R M, Stimming U. Analysis of the photoelectrochemical response of the passive film on iron in neutral solutions[J]. J Electrochem Soc, 1988,135(6): 1358 - 1363.
  • 6[6]Wilhelm S M, Tanizawa Y, Hackerman N. Photoelectrochemical characterization of passive film on iron[J]. Corrosion Science, 1982,22: 791- 794.
  • 7[7]Butler M A, Ginley D S. Prediction of flatband potentials at semiconductor - electrolyte interfaces from atomic electronegativities[J ]. J Electrochem Soc, 1978,125(2) :228 - 230.
  • 8[8]Mott N F, Davis E A. Electronic processes in noncrystalline solids[M]. Oxford: Clarendon Press, 1979.
  • 9[9]Azumi K, Ohtsuka T, Sato N. Spectroscopic photoresponse of the passive film formed on iron[J]. J Electrochem Soc, 1986,133 (7):1326 -1328.
  • 10[10]Morrison S R. Electrochemistry at semiconductor and oxidized metal electrodes[M]. New York: Plenum Press, 1980.

同被引文献20

  • 1颜立成,张俊喜,魏增福,张鉴清.不锈钢载波钝化膜的光电化学研究[J].中国腐蚀与防护学报,2005,25(4):209-212. 被引量：3
  • 2葛红花,周国定,孙月平,张慧鑫.模拟水中硫离子对不锈钢钝化膜破坏作用的光电化学研究[J].中国腐蚀与防护学报,2006,26(6):325-328. 被引量：3
  • 3Stimming U. Photoelectrochemical studies of passive films[J]. Eleetroehim Aeta, 1986,31 (4): 415-429.
  • 4Cai S M,Jiang D L, Zhang J J, et al. Semiconductive properties and photoelectrochemistry of iron oxide electrodes-IX. Photoresponses of sintered Zn-doped ox ide electrode[J]. Electrochim Acta, 1992,37(3) :425 -428.
  • 5Marsh J,Gorse D. A photoelectrochemical and AC impedance study of anodic titanium oxide films[J]. Electrochim Acta, 1998,43(7) : 659-670.
  • 6Zhou G D,Shao H,Loo B H. A study of the copper electrode behavior in borax buffer solutions containing chloride ions and benzotriazole-type inhibitors by voltammetry and photocurrent response method[J]. J Electroanal Chem, 1997,42(1/2) : 129- 135.
  • 7Modestov A D, Zhou G D, Ge H H,et al. A study of copper electrode behavior in alkaline solutions contai ning benzotriazole-type inhibitors by the photocurrent response method and intensity modulated photocurrent spectroscopy[J]. J Electroanal Chem, 1994,375 (1/2):293--299.
  • 8Yang M,Chen L,Cai S. Photoelectrochemieal study of pitting on iron in borate buffer solution containing in hibitor[J]. Corrosion, 1997,53 (1) : 11 -- 15.
  • 9Ge H H, Zhou G D, Liao Q Q, et al. A study of anticorrosion behavior of octadecylamine-treated iron samples[J]. Appl Surf Sci, 2000,156 :39-46.
  • 10Modestov A D, Zhou G D, Ge H H,et al. A study by voltammetry and the photocurrent response method of copper electrode behavior in alkaline solutions containing chloride ions[J]. J Electroanal Chem, 1995, 380 (1/2) :63-68.

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同济大学学报（自然科学版）
2001年 第5期

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