摘要
ＩＰ（Ｉｎｔｅｌｌｅｃｔｕａｌ Ｐｒｏｐｅｒｔｙ）复用技术是提高片上系统设计效率、缩短设计周期的一个关键。本文简要介绍了ＩＰ产生的原因、ＩＰ的概念与分类，分析了可复用ＩＰ的设计流程及相关工具，探讨了片上系统设计中的ＩＰ复用以及当前面临的主要问题，最后指出了ＩＰ的市场前景和未来发展趋势。
Intellectual Property (IP) Reuse is one of the keys to improve design productivity and shorten design circle. This paper briefly introduces the reasons for IP, its concept and classification, analyses the design flow and tools for reusable IP, discusses the IP reuse in the SOC design and current main issues, finally points out the foreground of IP market and its developing trends.
出处
《半导体技术》
CAS
CSCD
北大核心
2001年第7期3-7,16,共6页
Semiconductor Technology
