脉冲激光制备硅基超薄PtSi薄膜

Platinum silicide formation during pulsed laser annealing prepared by pulsed laser deposition

用脉冲激光沉积制备了纳米级 Ｐｔ／Ｓｉ异质层．对脉冲激光退火形成超薄 ＰｔＳｉ 薄膜进行了研究。对于 Ｐｔ、Ｓｉ互扩散反应形成 Ｐｔ２Ｓｉ和 ＰｔＳｉ的过程利用 ＸＰＳ进行了测试分析，通过ＸＰＳ和ＡＦＭ等分析测试手段对不同参数激光退火形成的ＰｔＳｉ薄膜的结构特性进行观测。我们获得了均匀的、超薄连续的ＰｔＳｉ层且具有平滑的 ＰｔＳｉ／Ｓｉ 界面。

The PtSi ultra-thin film formation by pulsed laser deposition during pulsed laser annealing has been studied . The growth sequence of the Pi2 Si and the PtSi phases that evolved as the result of the diffusion reaction in the bilayers was monitored by XPS. The structure characteristics of PtSi thin films prepared by different preparing conditions were investigated by XPS and AFM. We got superior uniformity , lower continuous film thicknesses of the resulting PtSi layers and smoother PtSi/Si interfaces.