摘要
本文报道了用改进的垂直气相法 (多级提纯垂直气相法 )生长富Cd的CdSe单晶体 ,并对晶体的性能进行了观测 ,其电阻率为 10 7Ωcm量级 ,电子陷阱浓度为 10 8cm- 3量级 ,第一次报道了 (110 )面的腐蚀形貌。结果表明 :采用这种方法制备CdSe单晶 ,设备简单 ,易于操作 ,在提纯和生长过程中不需要转移原料 ,有利于减少晶体中的杂质含量 ,降低位错密度 ,改善晶体的电学性能。多级提纯垂直气相法是一种有前途的CdSe单晶体生长的新方法。
High quality CdSe single crystals with excess Cd(10mm in diameter and 45mm in length) were grown using modified sublimation technique,i.e.vertical unseeded vapor growth with multi step purification.Purification of polycrystalline material and growth of CdSe single crystals were carried on in the same quartz ampoule.The resistivity of the crystal was measured to be of 10 7—10 8Ω cm order,and the electron trap densities of 10 8cm -3 .The etch pit patterns of (110)face was reported for the first time.The results showed that this was a new and promising method for growing high quality CdSe single crystals.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2001年第2期119-122,共4页
Journal of Synthetic Crystals
基金
教育部重点科技项目
高等学校骨干教师资助计划