摘要
用溅射技术制作γ—Fe_2O_3磁性薄膜,并通过透射电子显微镜观察磁性薄膜的电子显微像和选区电子衍射环,进行了γ-Fe_2O_3,晶体结构分析,讨论了多晶薄膜的生长条件。
γ- Fe2O3 magnetic thin films have been prepared by sputtering technique, and studied by transmission electron microscopy. The crystal structure of the films has been analyzed from the selected area electron diffraction patterns. The growth conditions of the polycrystalline thin films are discussed.
