凹折射微透镜阵列的离子束刻蚀制作

Concave Refractive Microlens Arrays Fabricated by Ion Beam Etching

利用光刻热熔成形工艺及离子束刻蚀制作 12 8× 12 8元凹微透镜阵列。所制硅及石英凹微透镜的典型基本图形分别为凹球冠形、凹柱形和矩顶凹面形。分析了在光致抗蚀剂柱凹微透镜图形制作过程中的膜系匹配特性 ,与制作该种微透镜有关的光掩模版的主要结构参数 ,以及光致抗蚀剂掩模工艺参数的控制依据等。探讨了在凹微透镜器件制作基础上利用成膜工艺开展平面折射微透镜器件制作的问题。采用扫描电子显微镜 (SEM)和表面轮廓仪测试了所制石英凹微透镜阵列的表面微结构形貌。给出了所制石英凹微透镜阵列远场光学特性的测试结果。

The concave microlens arrays of 128× 128 element are fabricated using a multiple-process including photolithography heat treatment, and ion beam etching. The typical structures of concave microlenses in quartz and silicon fabricated are concave sphere crown shape, concave cylinder, and square-top concave shape. The main characteristics, such as the matching behaviors of films coated on substrates in fabrication of concave cylinder photoresist microlens arrays, the structural parameter design of photoetching mask which is relevant to the fabrication of the microlens, and control basis of photoresist mask technological parameters, are analyzed respectively. The fabrication of plane refractive microlens arrays, for instance using the coating technique on the concave microlens plate, is discussed. The dimension and the surface micromorphology of the concave microlens array in quartz substrate are determined with scanning electron microscope and surface contourgraph. The far-field optical characteristics of concave microlens array in quartz substrate are given.