蚀刻衍射光栅波分复用器件的设计与模拟

DESIGN AND SIMULATION FOR ETCHED DIFFRACTION GRATING FOR DWDM IN OPTICAL COMMUNICATION

近年来光通信飞速发展 ,波分复用技术 (WDM)是满足要求的有效手段 .密集波分复用技术已经得到成功商用 ,其扩展信息传输容量的能力也在不断增强 .作为波分复用中最关键的器件 ,蚀刻衍射光栅 (EDG)是平面波导密集波分复用器件中很有发展潜力的一种 .本文分析了 EDG器件的解复用原理 ,参量设计 ,工艺过程 .文章最后 ,建立了一个光栅干涉的简单模型 ,对设计好的器件参量进行模场形状、谱响应、色散等光栅性能的模拟 ,得到基本的器件解复用特性 。

The optical communication is developing at very fast speed these years.Wavelength Division Multiplexing (WDM) is an effective technique to meet the fast grown demand for communication capacity.Dense Wavelength Division Multiplexing (DWDM) has been successfully put into commercial use.DWDM′s ability of expanding the communication capacity is in continuous growth.As the key device of a DWDM system,Etching Diffraction Grating (EDG) is one of the most potential types of planar waveguide DWDM devices.In this paper a brief introduction of EDG is presented,the design of the EDG parameters is analyzed and the manufacture process is described.A simple model for the simulation of EDG is introduced and the basic demultiplexing characteristics of EDG is obtained.Numerical results for the intensity distribution along the output,the spectral response and the dispersion are given and analyzed.