摘要
研究了MIM器件的电导机制,详细介绍了新提出的MIM器件的p-n--n能带模型,同时利用这一能带模型解释并验证了上电极材料的选择、下电极材料掺N以及用溅射Ta2O5膜代替阳极氧化Ta2O5膜作绝缘层对MIM器件伏安特性曲线对称性的影响。利用p-n--n能带模型首次提出用在氢气气氛下热处理的阳极氧化Ta2O5膜作MIM器件的绝缘层可以提高器件的I-V特性曲线的对称性这一新的实验方法。另外,本文还较为详细地讨论了阳极氧化过程对MIM器件特性的影响,并首次讨论了对阳极氧化Ta2O5膜进行热处理时,退火方式和反应室气压变化对MIM器件I-V特性的影响。
お? The conductive mechanism of the MIM element is studied and a new p-n--n band model is presented in detail Meanwhile, the effect of the selection of the top-electrode, the bottom-electrode with the doping N, use of the sputtered Ta2O5 film instead of the anodic Ta2O5 film on the I-V characteristics of the MIM element is interpreted by using the p-n--n band model The symmetry of I-V characteristics of the MIM element with the hydrogen-treated Ta2O5 as insulator is improved On the other hand, the effect of the anodic oxidation process, annealing method and the pressure in the reactive tube on the characteristics of the MIM element is discussed in detail
出处
《液晶与显示》
CAS
CSCD
1998年第2期98-111,共14页
Chinese Journal of Liquid Crystals and Displays
基金
吉林省科委"九五"重大项目