用于PDP应用的高速MgO溅射源

HIGH RATE MgO SPUTTER SOURCEFOR PDP APPLICATIONS

ＢＰＳ研制出一种用于ＰＤＰ应用的新型高速ＭｇＯ溅射源。该溅射源与现有的用于大批量生产的立式串级系统完全兼容。工艺过程是基于在金属镁靶上进行的全反应。此装置采用特殊设计，可解决低附着率以及由于靶电弧所引起的工艺不稳定等问题。本文还进一步讨论了表面拓朴学，溅射阻力以及其它有影响的参数。

お new high rate MgO sputtering source for PDP applications has been developed by BPS. The source is fully compatible with existing vertical In-Line systems for high volume production.The process is operated fully reactive from a metallic Mg target. By some special design features the problems of a low deposition rate and process instabilities caused by target arcing could be overcome.Furthermore the surface topology, the resistance to sputtering and the influencing parameters are discussed.