金刚石膜/多孔硅复合材料的性能表征

Characterization of CVD Diamond Film/Porous Silicon Composite

提出了一种新颖的多孔硅表面钝化技术 ,即采用微波等离子体辅助的化学气相沉积 (MPCVD)方法在多孔硅上沉积金刚石薄膜。采用原子力显微镜 (AFM)、扫描电子显微镜 (SEM )、X射线衍射仪 (XRD)、拉曼光谱仪和荧光分光光度计对多孔硅及金刚石膜的表面形貌、结构和发光特性进行了表征。结果表明采用微波等离子体化学气相沉积法可在多孔硅基片上形成均匀、致密、性能稳定且对可见光具有全透性的金刚石膜。金刚石膜与多孔硅的复合 ,大大稳定了多孔硅的发光波长和强度 ,同时增强了多孔硅的机械强度。

A novel passivation technology of porous silicon (PS) surface, i.e., depositing diamond film on the PS surface by microwave plasma assisted chemical vapor deposition (MPCVD) method, was developed. The morphologies, structure and photoluminescence (PL) of porous silicon and diamond film were characterized using atomic force microscopy, scanning electron microscopy, X-ray diffraction, Raman spectrometer and PL spectrometer. The results indicated that the homogeneous and dense diamond film could be obtained by MPCVD method on PS, which stabilized greatly the luminescent wavelength and intensity, and moreover enhanced the mechanical strength of PS.