高效高速低温镀铬工艺的研究

Study on Chromium Plating Process with a High Efficiency and High Deposition Speed in Room Temperature

以ERC为催化剂的铬酸电解液,在D_K=50～120A/dm^2条件下,可达到ηk=40～60％,沉积速度100～240μm/h,镀液温度在20～45℃之间,可自然升温操作。是一种高效、高速,低温的工程镀铬电解液。其分散能力优于Sargent体系。镀层硬度H_V>800。

In this process, the ERC was used for new catalyst in chromium plating bath. When the current density is 50～20A/dm^2, the cathode current efficiency is 40～60%. The rate of deposition up to 100～240μm/h can be achieved. The operating temperature of bath ranges from 20℃ to 45℃. The hardness of Cr coating is more than Hv 800. Throwing power of this bath is better than that of Sargent bath.