Al,Si,Mn,Cu杂质原子在纯Ni激光熔凝过程中的重新分布

REDISTRIBUTION OF IMPURITY ATOMS Al, Si, Mn AND Cu IN PURE Ni DURING LASER MELTING

本文重点测量了Al,Si,Mn,Cu杂质原子在纯Ni激光慢速重熔过程中的重新分布。建立了一维传热的解析解模型。对杂质原子重新分布的规律提出了合理的解释。研究结果表明:固液界面溶质再分配是导致深度方向杂质原子重新分布的主要原因。此外,杂质原子从低温向高温区的扩散以及表面杂质原子的选择性蒸发对分布规律的形成也具有不可忽视的贡献。

An explanation of redistribution of impurity atoms, such as Al, Si Mn and Cu, in pure Ni during lower speed laser melting was made on the basis of proposed analysis mo- del for one-dimension heat transfer, The redistribution of solute along solid-liquid interface seems to be the principal reason why the impurity atoms redistributed in depth. The diffusion of the impurity atoms from low to high temperature zone and their selective surface evapora- tion are believed to be noticeably contributed to the distribution.