摘要
概述化学气相沉积技术的一般原理与技术 ,总结化学气相沉积技术在材料制备方面的发展与应用状况 。
The general rule and technology of chemical vapor deposition(CVD) were introduced first. The development and application of CVD technology in preparation of materials were reviewed, especially in the preparation of films and coatings of precious metals.
出处
《稀有金属》
EI
CAS
CSCD
北大核心
2001年第5期364-368,共5页
Chinese Journal of Rare Metals
基金
云南省应用基础研究基金资助项目 ( 2 0 0 0E0 0 85M)
关键词
化学气相沉积
材料制备
贵金属
薄膜
涂层
Chemical vapor deposition,Material preparation,Precious metals
