BaTiO_3薄膜的磁控溅射生长及特性研究

Sputtering Growth of BaTiO_3 Thin Films and the Films Property Studies

用射频磁控溅射方法制备了 Ba Ti O3 (BT)薄膜。用扫描电镜 (SEM)观察了 Ba Ti O3 薄膜表面形貌、截面结构。电子探针分析表明样品具有良好的组份均匀性。

BaTiO 3 thin films have been prepared by magnetic RC sputtering deposi tion technique. The SEM images and the spectrums showed that the prepared BaTiO 3 films have good microstructure and even organization. Similar result could be drawn by measuring the films dielectric property.