摘要
介绍了水冷反应室式MWPCVD制备金刚石膜装置的结构和工作原理 ,着重讨论了该装置长时间大功率稳定运行的措施。该装置在微波输入功率为 3 0kW时能长时间稳定运行。
The setup and the operation theory of the reaction chamber water cooled MWPCVD apparatus for diamond films deposition is concisely presented, and the method for its steady operation on heavy duty for a long period of time is emphatically discussed The MWPCVD apparatus can steadily operate for a long period of time on the condition of 3 0kW input microwave power The diamond films are successfully prepared on silicon substrates in this apparatus
出处
《高技术通讯》
EI
CAS
CSCD
2001年第7期88-90,共3页
Chinese High Technology Letters
基金
863计划资助项目 (863-715- 002-0020)
