摘要
介绍了一种既高效透过红外光 ,同时又能有效屏蔽电磁干扰的金属网栅薄膜的基本原理和制备工艺。分析了网栅参数对其光学及电磁性能的影响。介绍了利用光刻和镀膜技术 ,在红外基片上制作线条宽度小于 10 μm ,周期约 35 0 μm的金属网栅。
This paper introduces the principle and manufacture process of a film-taped metallic mesh, which is transparent for infrared and shield electromagnetic wave. This paper analyzes the influence of the parameters of metallic mesh film on optical and electromagnetic features. By using the photolithograph and coating technology, the metal mesh film on IR substrate is made, the line width of metallic mesh less than 10μm, the period is about 350μm.
出处
《光学技术》
CAS
CSCD
2001年第6期558-559,共2页
Optical Technique
关键词
光刻
镀膜
金属网栅
电磁屏蔽
红外
photolithograph
coating
metal mesh
shield electromagnetic wave
infrared