摘要
采用火焰水解法 ( FHD)在 Si片上快速淀积出 Si O2 厚膜材料 ,材料膜厚 40 μm以上 ,生长速率 8μm/ min.将该材料分别在真空中和空气中高温致密化处理 ,获得各种形态的二氧化硅厚膜材料 .利用 XRD,SEM,电子显微镜等仪器对 Si O2
The SiO 2 thick films were deposited on silicon substrate by flame hydrolysis deposition (FHD). The thickness of the films was up to 40 μm, and the deposition speed was as high as 8 μm per minute. Then, the films were consolidated in electric furnaces both in vacuum and air ambience. Finally, the silica films were analyzed by means of XRD, SEM, microscopy, etc.
出处
《吉林大学自然科学学报》
CAS
CSCD
北大核心
2001年第4期53-56,共4页
Acta Scientiarum Naturalium Universitatis Jilinensis
基金
国家 973项目资助 (批准号 :G2 0 0 0 36 6 0 2 )
