摘要
研究了硬质合金基体的预处理对金刚石沉积的影响,并确定了用 MPCVD法在 WC- Co刀具 上沉积金刚石薄膜的工艺参数。采用了一些提高成核密度和沉积速率的方法, 用 SEM、 XRD和 Raman对金刚石薄膜的性质进行了分析。结果表明,合适的预处理可以有效的抑制钴的溢出并提 高薄膜的质量。
The effects of substrate pretreatment and processing parameters on the quality of diamond coating on WC- Co tools were reported. The diamond coatings were analyzed with scanning electron microscopy (SEM), X- ray diffraction (XRD) and laser Raman spectrometer (Raman). Efforts to improve the nucleation density and deposition speed were also undertaken. The results show that suita-ble substrate pretreatment can effectively control the overflow of cobalt and improve the quality of coating.
出处
《功能材料与器件学报》
CAS
CSCD
2001年第3期227-230,共4页
Journal of Functional Materials and Devices
基金
Hubei Natural Science fund