摘要
对各种磁控溅射的工艺参数控制技术进行比较 ,分析各自的特色 。
Various process control modes in reactive magnetron sputtering were evaluated. As indicated in this paper, optical thickness monitoring was much more important in the precision optical multilayer production by reactive sputtering processes.
出处
《光学仪器》
2001年第5期63-67,共5页
Optical Instruments
关键词
反应磁控溅射
溅射工艺控制
电介质薄膜
reactive magnetron sputtering
sputtering process control
dielectric thin films
