摘要
介绍了一种由纯Ni和纯Al合成的特制靶材及用射频磁控溅射法沉积NiAl涂层的新工艺。试验结果表明 ,该NiAl涂层呈整齐的立方晶体结构 ,涂层厚约l0 μm ,晶粒尺寸约 10nm 。
NiAl intermetallic coating is fabricated using an rf magnetron sputtering system and as pecially-designed composite target made from pure Ni and Al metals. The experiments show that the coating which is about 10μm thick is an NiAl with the ordered cubic crystal structure. It also shows that the grainsize of NiAl is about .10nm, and the coating has excellent wear resistance, as well as good bonding between coating and substrate.
出处
《表面技术》
EI
CAS
CSCD
北大核心
2001年第5期29-31,35,共4页
Surface Technology
