相关因素对钴铬合金碱性电解蚀刻的影响及蚀刻粘结面超微结构观察

Study on Correlative Factors Affecting Alkaline Electrolytic Etching in Cobalt-chromium Alloy and the Ultrastructure in Cohesive Face of Etching.

目的 :探讨碱蚀浓度和电流电压值对钴铬合金蚀刻的影响 ,并从中优选出具有最大粘结强度的前处理组。方法 :经三组不同的碱蚀浓度和电流电压值蚀刻后的钴铬合金 ,以 10mm/min的速度进行抗张强度测试 ,并运用扫描电镜进行观察。结果 :在 15 %NaOH蚀刻液和 15V/ 2 5 0mA的前处理条件下 ,钴铬合金与粘接树脂的抗张强度最高 ,电镜下发现 ,断裂主要发生在粘结树脂颗粒与偶联剂之间。结论 :碱蚀刻最佳前处理条件为 :15 %NaOH和 15V/ 2 5 0mA ,电镜下观察到的碱蚀微孔和四周散在的线条形白色致密区 ,进一步证实了钴铬合金碱蚀理论。

Objective:To Study and evaluate the etching effect of the concentration of alkaline etching solution and the intensity of electric current and voltage on cobalt Chromium alloy,this study was focused on chiocing the optimum anti tention strength.Methods:To per process three groups of cobalt chromium alloy through differently concentrations of alkalive etching solution and the intensities of electric current and voltage,we have tested the anti tention strength of the groups and observed the changes of ultrastructure in cohesive face of etching in the groups under the scanning electron microscope .Results:on the per processing condition of 15% NaOH etching solution and 15v/250mA the anti tention strength of cobalt chromium alloy and cohesive resin were greatest.Under the electron microscope the breaking of cohesive face in alloy appeared mostly between the granules in cohesive resin and coupling agents.Conclusion:The best per processed conditions of alkaline electrolytic etching were 15% NaOH and 15v/250mA.The etching millipores and the white scattered linear dense areas around the millipores confirmed the theory of alkaline electrolytic etching in cobalt chromium alloy.