期刊文献+

梯度复合B_4C/Cu面向等离子体材料的制备与表征 被引量:2

Processing and Characterization of Graded B_4 C/Cu Facing Plasma Composite
下载PDF
导出
摘要 基于B4C和Cu材料具有明显电阻率及熔点差的特点,提出了在超高压下通电快速烧结B4C/Cu梯度复合材料的新工艺.在 2~4GPa、12kW,40s及适当的热处理条件下成功制备出了成分分布从0~100%的接近理论密度的B4C/Cu层状复合材料;显微观察显示材料的成分和结构是呈梯度分布的.化学溅射实验表明其产额比 SMF 800核纯级石墨降低 70%;在Tokamak原位等离子体辐照下,材料表面无明显损伤. Based on their distinct resistivity and melting point, a new approach for fabricating graded B4C/CU composite by rapid self-resistance sintering under ultra-high pressure was proposed in this paper and with which a near dense plasma facing material with 0similar to100% compositional distributions of B4C was obtained on conditions of 12kW electric power input, 2similar to4GPa pressure applied, 40s duration and properly consecutive heat treatment. Well-graded composition and structure of that composite were demonstrated by SEM analysis. Tests on plasma relevant performances show that the chemical sputtering yield of B4C/Cu graded composite is 70% lower than that of SMF 800 nuclear graphite, and the surface of the composite is almost no damages after in-situ plasma irradiation in Tokamak apparatus.
出处 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2001年第6期1121-1127,共7页 Journal of Inorganic Materials
基金 863资助项目(715-011-0230)
关键词 功能梯度材料 复合材料 面向等离子体材料 碳化硼 烧结 制备 表征 B4C/Cu functionally graded material composite plasma facing material boron carbide copper sintering
  • 相关文献

参考文献3

二级参考文献2

共引文献12

同被引文献60

  • 1孙金坛,邱德润.非晶碳化硼薄膜[J].合肥工业大学学报(自然科学版),1993,16(3):165-168. 被引量:2
  • 2唐国宏,张兴华,陈昌麒.碳化硼超硬材料综述[J].材料导报,1994,8(4):69-72. 被引量:43
  • 3Valentine P G,Trester P W,Winter J,et al. B4C-SiC reaction-sintered coating on graphite for plasma facing components [ J ]. Journal of Nuclear Materials, 1995,220-222:756-761.
  • 4Terry Hu, Lynn Steihl, William Rafaniello, et al. Structures and properties of disordered boron carbide coatings generated by magnetron sputtering [ J ]. Thin Solid Films, 1998,332:80-86.
  • 5Chen Hai-Ying, Wang Jing, Yang Hai, et al.Synthesis of boron carbide films by ion beam sputtering [ J ].Surface and Coatines Technology. 2000.128-129.329-333.
  • 6Kokai F,Taniwaki M,Takahashi K,et al.Laser ablation of boron carbide : thin-film deposition and plume analysis [ J ].Diamond and Related Materials ,2001, ( 10 ) : 1412-1416.
  • 7Lousa A, Gimeno S.Ion assisted deposition of thin films by substrate tuned radio frequency magnetron sputtering [ J ].Journal of Vacuum Science & Technology A, 1997,15 ( 1-2 ) :62-65.
  • 8Pascual E, Martinez E, Esteve J, et al. Boron carbide thin films deposited by tuned-substrate RF magnetron sputtering[ J ]. Diamond and Related Materials, 1999, ( 8 ) :402--405.
  • 9Shin-ichi Aoqui, Hisatomo Miyata, Tamiko Ohshima, et al.Preparation of boron carbide thin film by pulsed KrF excimer laser deposition process [ J ]. Thin Solid Films, 2002,407 : 126-131.
  • 10Kustas F,Mishra B,Zhou J. Wear behavior of B4C-Mo cosputtered wear coatings[ J ]. Surface and Coatings Technology ,2001,141:48-54.

引证文献2

二级引证文献10

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部