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CMOS器件X射线与γ射线辐照效应比较 被引量:5

Comparison on effects of CMOS devices irradiated by gamma and X ray
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摘要 介绍了低能X射线和γ射线的辐照剂量及器件阈电压漂移的测试方法。讨论了不同偏置条件和辐照方向对器件效应的影响。结果表明 ,对镀金Kovar合金封装的器件 ,在背向辐照的最劣辐照偏置下 ,X射线产生的阈电压漂移是60 Coγ射线的 13.4倍。 The methods for measuring the dose induced by low energy X rays and 60 Co γ rays and the threshold voltage shift the devices are described. The influences of the different biases and irradiation directions on the devices are discussed. The results for the devices packaged by gold plating Kovar aolly under a worst case in which the two kinds of rays are incident from the back side are given. The threshold voltage shift for the low energy X rays is 13.4 times larger than that for the 60 Co gamma rays.
出处 《核技术》 CAS CSCD 北大核心 2001年第10期807-811,共5页 Nuclear Techniques
关键词 CMOS器件 X射线 Γ射线 剂量增强 辐照效应 辐照剂量 CMOS device, X ray, γ ray, Dose enhancement
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参考文献2

  • 1田志恒,辐射剂量学,1992年
  • 2Sour J R,Radiation effects on and dose enhancement of electronic material,1984年

同被引文献29

  • 1Vassiliki Vlachopoulou,Georgia Malatara,Harry Delis,Kiki Theodorou,Dimitrios Kardamakis,George Panayiotakis.Peripheral dose measurement in high-energy photon radiotherapy with the implementation of MOSFET[J].World Journal of Radiology,2010,2(11):434-439. 被引量:1
  • 2胡华四,许浒,张国光,王群书,谢仲生,褚俊,张建福.新型核辐射屏蔽材料的优化设计[J].原子能科学技术,2005,39(4):363-366. 被引量:30
  • 3李春槐,傅守信,刘桂莲,赵成昆,张传旭,张立吾,赵增魁.核电站反应堆辐射屏蔽程序系统[J].核动力工程,1995,16(6):492-497. 被引量:2
  • 4赖祖武.抗辐射电子学[M].北京:国防工业出版社,1998.46.
  • 5Agakhanyan T M. Bases of transistor electronics[M]. Moscow: Energy,1974. 267.
  • 6Saks N S,Klein R B,Griscom D L. Formation of interface traps in MOSFETs during annealing following low temperature irradiation[J].IEEE Trans Nucl Sci ,1988,35(6) :1234.
  • 7Beutler D E, Fleetwood D M, Beezhold W.Variations in semiconductor device response in a medium -energy X -ray dose -enhancing environment [J]. IEEE Trans. Nucl. Sci.,1987,34 (6):1544.
  • 8Shaneyfelt M R. Charge yield for cobalt-60 and 10 keV X-ray irradiation[J]. IEEE Trans. Nucl. Sci., 1991,38(6): 1 187.
  • 9Benedetto J M, Boesch H E, Oldman T R, et al.Measure ment of low energy X-ray dose enhancement in MOS devices with metal silicide gates [J].IEEE Trans. Nucl. Sci., 1987,34(6): 1 540.
  • 10Saks N S,Klein R B,Griscom D L. Formation of interface traps in MOSFETs during annealing following low temperature irradiation [J]. IEEE Trans.Nucl.Sci., 1988,35(6): 1 234.

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