分子镀法制备Ba靶

Preparation of Ba Target With Molecular Plating Method

用铂丝作阳极 ,不锈钢底衬作阴极 ,在异丙醇 -盐酸介质中制备 Ba靶。对影响 Ba电镀的因素——电镀时间和电流密度进行了探讨。通过高纯锗探测器测量 13 3 Ba示踪剂的活性确定 Ba的电沉积效率。结果表明 ,电流密度为 4 .0～ 6 .0 m A/cm2 时 ,通过分子镀沉积 30 min可在不锈钢片上获得均匀、牢固的 Ba镀层 ,其厚度为 0 .5～ 1.0 mg/cm2 。

The thin films of Ba are prepared by electro deposition from the isopropyl HCl mixture with a platinum wire as anode and a stainless steel plate as cathode. The influence of current desity and deposition time on deposition efficiency of barium is studied. The activities of 133 Ba tracer are measured by a HPGe detector to determine the deposition yield of barium. The results show that uniform and adhering films of barium are obtained on stainless steel foils by molecular plating method, and the thickness of Ba films is 0.5～1.0 mg/cm 2 under the conditions of the current density of 4～6 mA/cm 2 and the deposition time of about 30 min.