摘要
通过在线等离子体清洗的玻璃基片表面沉积的ITO (或SiO2 )膜 ,不仅具有优良的光电特性 ,而且提高了膜层在基片上的附着力。与未经在线等离子体清洗的基片沉积的ITO膜相比 ,膜层附着力提高了 3.5倍。此项成果已在ITO膜透明导电玻璃连续生产线上得到应用。
A novel industrial on-line Plasma cleaning technique has been developed to clean the glass substrates before ITO film grown.The advantages of the technique include higher quality ITO films growth, stronger (3.5 times higher )interface cohesion than the conventional surface cleaning.
出处
《真空科学与技术》
CSCD
北大核心
2001年第6期499-500,共2页
Vacuum Science and Technology
