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非晶碳化硼涂层刀具 被引量:1

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作者 谢起新
出处 《航空制造工程》 1989年第11期11-13,共3页 Aviation Engineering & Maintenance
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  • 1孙金坛,邱德润.非晶碳化硼薄膜[J].合肥工业大学学报(自然科学版),1993,16(3):165-168. 被引量:2
  • 2唐国宏,张兴华,陈昌麒.碳化硼超硬材料综述[J].材料导报,1994,8(4):69-72. 被引量:43
  • 3Valentine P G,Trester P W,Winter J,et al. B4C-SiC reaction-sintered coating on graphite for plasma facing components [ J ]. Journal of Nuclear Materials, 1995,220-222:756-761.
  • 4Terry Hu, Lynn Steihl, William Rafaniello, et al. Structures and properties of disordered boron carbide coatings generated by magnetron sputtering [ J ]. Thin Solid Films, 1998,332:80-86.
  • 5Chen Hai-Ying, Wang Jing, Yang Hai, et al.Synthesis of boron carbide films by ion beam sputtering [ J ].Surface and Coatines Technology. 2000.128-129.329-333.
  • 6Kokai F,Taniwaki M,Takahashi K,et al.Laser ablation of boron carbide : thin-film deposition and plume analysis [ J ].Diamond and Related Materials ,2001, ( 10 ) : 1412-1416.
  • 7Lousa A, Gimeno S.Ion assisted deposition of thin films by substrate tuned radio frequency magnetron sputtering [ J ].Journal of Vacuum Science & Technology A, 1997,15 ( 1-2 ) :62-65.
  • 8Pascual E, Martinez E, Esteve J, et al. Boron carbide thin films deposited by tuned-substrate RF magnetron sputtering[ J ]. Diamond and Related Materials, 1999, ( 8 ) :402--405.
  • 9Shin-ichi Aoqui, Hisatomo Miyata, Tamiko Ohshima, et al.Preparation of boron carbide thin film by pulsed KrF excimer laser deposition process [ J ]. Thin Solid Films, 2002,407 : 126-131.
  • 10Kustas F,Mishra B,Zhou J. Wear behavior of B4C-Mo cosputtered wear coatings[ J ]. Surface and Coatings Technology ,2001,141:48-54.

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