MOCVD计算机控制系统的设计与实现

The desing and realization of the MOCVD computer control system

MOCVD是金属有机化学气相沉积技术的简称,即通过MOCVD设备,在衬底上生长材料晶体的一种方法。用这种方法生长出来的晶体可用于各种芯片的制造。这是当前研制新型光电材料的重要方法之一。针对手工操作的种种不便,我们在MOCVD系统中引入了计算机控制,实现了用微机控制MOCVD生长的全过程。本文详细介绍了该MOCVD计算机控制系统的设计及实现方法,重点论述了其中的软件设计与实现方法。

MOCVD stands for Metalorganic Chemical Vapor Deposition,is one technology used to grow wafers from underlay with the MOCVD equipment.The wafers grown by this technology can be used to produce various chips. MOCVD is an important technology to develop new photoelectric material currently.In the process of growing wafer material,it is very inconvenient to adjust some gas flux and switch valves frequently by hand.Manual operation .As the development of the computer application,computer control is devoted to the MOCVD system.We use computer to control the whole growth process.In this paper,we particularly introduce the design and realization of the MOCVD computer control system and mainly introduce the portion of software.