摘要
考虑在压应力作用下磁畴的择优分布,应用磁畴转动模型,建立了在压应力作用下材料的磁致伸缩与磁场强度的关系.当 H ≤ 80 kA/m、在较大压应力作用下时,计算结果与实验值基本符合.表明该表达式反映了在压应力作用下磁化机制,可以应用该式来描述材料在较低磁场强度下的磁致伸缩.
A expression between magnetostriction and magnetic fields under applied stress was founded by considering the aligned orientation contribution of magnetic domains under applied stress and using the turning model of magnetic domains. The result of calculation is primarily in agreement with that of experiments when H < 80 kA/m and o = -21 MPa. This indicates that the expression reflects the magnetic mechanism of Teffenol D and it can be used to describe the relation between magnetostriction and magnetic fields under low magnetic fields and high applied stress.
出处
《河北工业大学学报》
CAS
2001年第1期5-8,共4页
Journal of Hebei University of Technology
基金
国家自然科学基金资助项目!(59871030)
河北省自然科学基金
!省教委博士基金资助项目