摘要
系统阐述了缩小投影 (或纳米投影 )电子束曝光技术的原理 ,以及如何将一台透射电镜改装为原理论证机的主要过程。内容包括机械结构的变动、电子光路的选择、调焦及曝光、成像系统的逐步演化。
The principle of the Projection Electron?beam Lithography with Demagnification Imaging(PELDI)and the process to rebuild a PELDI proof?of?concept system with a Transmission Electron Microscope(TEM)are introduced in detail.The contents are as follows:the changes of the mechanical structure,the selection of electron?optics,focus and exposure, the evolvement of the imaging system and the results of the experimental exposure.
出处
《微细加工技术》
2001年第4期6-11,共6页
Microfabrication Technology
