期刊文献+

PMMA在LIGA技术中的应用

Application of PMMA Resist in LIGA Technique
下载PDF
导出
摘要 合成了用于LIGA微细加工技术的聚甲基丙烯酸甲酯抗蚀剂 ,采用同步辐射装置X射线深度曝光 ,可得到深宽比 4 5~ 90 ,深度大于 4 50微米 ,细线宽 5~ 1 The PMMA resist used in LIGA microfabrication is synthesized.The lithographic patterns with line width of 5~10μm,height of over 450μm and the aspect ratio of 45~90 are obtained by deep exposure using X ray from synchrotron radiation device.
出处 《微细加工技术》 2001年第4期36-38,43,共4页 Microfabrication Technology
基金 国家基金委资助项目 (5 94 730 11)
关键词 LIGA技术 集成电路 微细加工技术 光刻 LIGA technique resist PMMA deep exposure
  • 相关文献

参考文献4

  • 1[1]Becker E W, Ehrfeld W, Hagmann P, et al. Fabrication of microstructures with high aspect rations and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding[J ]. Microelectronic Engineering, 1986,4:35.
  • 2[2]Ehrfeld W,Bley P,Gtz F,et al. Progress in deep-etch synchrotron radiation lithography[J].J Vac Sci Technol, 1988,136( 1 ): 178.
  • 3[3]Bley P,Bacher W,Menz W,et al. Description of microstructures in LIGA-technology[J]. Microelectronic En gineering, 1991,13:509.
  • 4[4]El-Kholi A,Bley P,Gottert J,et al. Exanmination of the solubility and the noleeular weight distribution of PMMA in view of an optimised resist system in deep etch X-ray lithography[J]. Microelectronic Engineering, 1993,21:271.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部