摘要
文章讨论了进入二十一世纪微电子科学技术所面临的诸多问题：超微细加工新技术，高电导率金属和低介电常数介质的互连技术， Ｓｉ Ｃ Ｍ Ｏ Ｓ 工艺的限制以及 Ｇａ Ａｓ
Many microelectronic science and technology problems facing 21 century are discussed in this arti cle . Such as super microstructure processing technologies , interconnection technology includinghighconductivity metal and low K dielectric , Si C M O Stechnology limitation and the rising of Ga As I C.
