摘要
本文通过化学镀方法在铜和钢上沉积非晶态Ni-B合金。着重讨论了还原剂浓度、络合剂浓度对化学镀沉积速率的影响;分析了它的耐蚀原因和其显微硬度随退火温度的变化情况并就其应用和发展略作说明。
In this paper, a process for the electroless deposition of amorphous nickel -boron alloy is described, and the effect of the concentration of the reducing agen-t and the complex agent on the rate of the electroless deposit is studied. Tine alloy hindrance-corrosion is analysed, and the alloy hardness at various annealing temperatures is discussed.
出处
《核化学与放射化学》
CAS
CSCD
北大核心
1989年第3期183-188,共6页
Journal of Nuclear and Radiochemistry
关键词
化学镀
非晶态
Ni-B合金
Hindrance-corrosion, Hardness, Eleotroless deposition, Amorphous nickel-boron alloy,
