期刊文献+

Novel Substrate pn Junction Isolation for RF Integrated Inductors on Silicon 被引量:5

新颖的衬底pn结隔离型硅射频集成电感(英文)
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摘要 A new method for reducing the substrate rated losses of integrated spiral inductors is presented.The method is to block the eddy currents induced by spiral inductors by directly forming pn junction isolation in the Si substrate. The substrate pn junction can be realized by using the standard silicon technologies without any additional processing steps.Integrated inductors on silicon are designed and fabricated. S parameters of the inductor based equivalent circuit are investigated and the inductor parameters are calculated.The impacts of the substrate pn junction isolation on the inductor quality factor are studied.The experimental results show that substrate pn junction isolation in certain depth has achieved a significant improvement.At 3GHz,the substrate pn junction isolation increases the inductor quality factor by 40%. 提出了一种新的减小硅集成电感衬底损耗的方法 .这种方法是直接在硅衬底形成间隔的 pn结隔离以阻止螺旋电感诱导的涡流 .衬底 pn结间隔能用标准硅工艺实现而不需另外的工艺 .本文设计和制作了硅集成电路 ,测量了硅集成电感的 S参数并且从测量数据提取了电感的参数 .研究了衬底结隔离对硅集成电感的品质因素 Q的影响 .结果表明一定深度的衬底结隔离能够取得很好的效果 .在 3GHz,衬底 pn结隔离能使电感的品质因素 Q值提高4 0 % .
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第12期1486-1489,共4页 半导体学报(英文版)
关键词 Si integrated inductor quality factor eddy current pn junction isolation 硅集成电感 品质因素 pn结隔离 衬底
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参考文献2

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同被引文献52

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