820离子源在600kV离子注入机上的应用

Application of the 820 ion source on the 600 kV ion implsnter

文章报道了820离子源在600kV离子注入机上的应用。已经从820离子源引出了20个以上的离子品种应用于半导体、金属和绝缘体的材料改性研究。还讨论了离子束流污染问题。

Application of the 820 ion source on the 600 kV heavy ion implanter is described. More than 20 ion species extracted from the ion source have been applied to the research of material modification of semiconductors, metals and insulaters. Ion beam contamina-tion is also discussed.