摘要
介绍近年来半导体工业中超纯水制备工艺的特点和发展,包括纯水回收系统、EDI技术、膜接触器技术等。
Introduction of characteristics & development on ultra pure water production process in semiconductor industry such as reclaim water system, EDI technology, membrane contactor technology etc.
出处
《洁净与空调技术》
2001年第4期32-37,共6页
Contamination Control & Air-Conditioning Technology
关键词
半导体
纯水回收系统
EDI技术
膜接触器
Semiconductors Reclaim water system EDI technology Membrane contactor technology.
