气相沉积法制备聚酰亚胺薄膜的光、电特性研究

Analysis on Optical and Electrical Properties of Polyimide Thin Films by Vapor Deposition Polymerization

以均苯四甲酸二酐 (PMDA)和二氨基二苯醚 (ODA)为单体原料 ,研究了在 3× 10 - 3Pa真空度下 ,通过控制双源单体的加入摩尔计量、加热时间和其沉积速率 ,在玻璃衬底上合成了聚酰亚胺的预聚体聚酰胺酸 ,再经 15 0～ 2 0 0℃真空加热亚胺化 1h后得到了成膜性良好的均匀聚酰亚胺薄膜。通过红外吸收、X射线衍射和扫描电镜等方法对样品的组织结构和特性进行了研究和探讨。结果表明 。

Using pyromellitic dianhydride (PMDA) and 4,4′-diaminodiphenyl ether (ODA) as monomer material, polyimide (PI) thin films have been prepared onto glass substrate by vapor co deposition polymerization under a vacuum of 3×10 -3 Pa and thermal curing of polyamic acid film in a vacuum at temperature of 150～200 ℃ for 60 min.In this process,the polymerization can be carried out through controlling the stoichiometric ratio,heating time and deposition rates of the two monomers.The composition,structure and properties of the PI films are investigated by using IR spectrum, XRD,SEM methods.The results show that the PI films by vapor deposition polymerization have good uniformity,fine electrical properties and high thermal stability.Therefore,the vapor deposition polymerization process is considered as a possible method for polymerization of other polymers.