稀土化合物浆料对CVD金刚石厚膜的刻蚀

Etching of CVD Diamond Thick Films by Rare-earth Compound Ink

ＣＶＤ金刚石厚膜具有极高的硬度，使得对其进行表面抛光极为困难．传统的机械抛光方法既不经济又耗费时间，而一些新的抛光技术又由于实验条件限制而难以推广．针对以上情况，我们寻求到一种新的化学刻蚀方法，即利用稀土化合物浆料对金刚石厚膜生长表面进行刻蚀，破坏表面的晶粒使之成为晶骸，降低表面的耐磨性，以提高表面粗糙的金刚石厚膜的抛光效率．

CVD diamond with high electrical, optical and thermal quality has been used in many applications. However, its inert chemical nature and high temperature stability make it difficult to be processed. A highly available etching technique compatible with existing diamond processing is desirable. In this paper, CVD diamond thick films were etched with rare-earth compound ink prepared by the authors. The etching process is taken in the atmosphere at a temperature below the oxidation temperature of diamond. The technique uses inexpensive and safe rare-earth compound ink and the experimental results show that the processing is simple and efficient for polishing the CVD diamond thick films rapidly. The results were studied by SEM.