摘要
重离子束轰击聚碳酸酯后,对样品进行陈化和紫外线照射敏化,在优化条件下蚀刻后得到纳米孔径核孔膜。利用电化学沉积技术在核孔膜中制备了最小孔径为30纳米的铜纳米线。获得的铜纳米线/聚碳酸酯可以作为x光纳米光刻的掩模。
Polycarbonate(PC)films were irradiated by heavy ions and illuminated with ultraviolet light .Nuclear track membranes with nanometer pore diameter were obtained by etching PC films under optimized condition.Copper nanowires with diameter30nm were electroplated into nuclear track mem-branes.The nuclear track membranes with copper nanowires can be used as the mask for x-ray nano-lithogaphy.
出处
《微纳电子技术》
CAS
2002年第1期44-45,共2页
Micronanoelectronic Technology
