摘要
采用磁控射频溅射法制备光波导用玻璃薄膜。本文重点分析了不同溅射条件如氧分压、基片种类、基片温度下制备的薄膜光学性能，通过比较，得到制备０．６３２８μｍ和１．５５μｍ窗口下光波导器件用玻璃薄膜所需溅射条件。
The glass thin film for optical waveguides is deposited by the magnetron sputtering ?The optical characteristics of glass thin films made by different sputtering technology conditions, such as oxygen content, substrate and substrate temperature are measured and analyzed. The waveguides capability of the thin film are researched . The condition which should be provided with to deposit glass thin film in the windows of 0.6328 μm and 1.55 μm is educed .
出处
《光电子技术与信息》
CAS
2002年第1期28-31,共4页
Optoelectronic Technology & Information
基金
华中科技大学激光技术国家重点实验室基金资助项目
关键词
玻璃薄膜
光波导
溅射工艺
制备工艺
glass thin film, optical waveguides, sputtering process
