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注入氮离子的SiC涂层阻氢性能研究 被引量:2

Hydrogen Resistance Property of Surface N^+ Implanting SiC Coating
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摘要 利用离子束混合 离子注入 (Ar+ )和磁控溅射相结合的实验技术在HR 1不锈钢基体上制备了注入N+ 的SiC涂层 ,并用表面分析手段对所制备涂层的表面形貌、剖面形貌、相结构、表面成分、表面元素的化学态进行了分析。结果表明 :制备的涂层结构致密、表面平整、膜层成分均匀 ;涂层与基体之间形成了一明显的过渡层 ,增强了涂层和基体之间的结合力。用二次离子质谱 (SIMS)对充氘涂层的阻氢性能进行了定性分析。结果表明 :涂层元素与氢形成稳定的化学键 ,抑制了氢的扩散和迁移 。 N\++ implanting SiC coating was prepared on HR\|1 stainless steel by ion beam mixing (IBM) known as ion implantation (Ar\++) followed by magnetron sputtering. The coating surface and cross\|section morphologies, phase structures, composition and elements were all analyzed by various surface analysis methods. Results indicated that the coatings were uniformity and smooth and compact, and there existed a mixed transition layer between films and matrix that enhanced the adhesion of coating and matrix. Deuterium\|implanting coating was analyzed by SIMS. Results showed that the coating had hydrogen\|resistance because there built stable chemical bond between coating elements and hydrogen so as to retard diffusion and transference of hydrogen.
出处 《材料保护》 CAS CSCD 北大核心 2002年第2期23-25,共3页 Materials Protection
关键词 离子束混合 注入N^+ SIC涂层 阻氢涂层 性能 氮离子 碳化硅 ion beam mixing (IBM) N\++ implanting SiC coating hydrogen\|resistant coating
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