磁控溅射B_4C薄膜的制备与力学性能

Preparation and Mechanical Properties of Magnetron Sputtered B_4C Thin Film

通过磁控溅射方法在不同基片温度下制备了B4C薄膜 ,利用傅立叶红外光谱、X射线衍射、透射电子显微镜表征了薄膜的微结构 ,并采用纳牛力学探针测量了薄膜的力学性能。结果表明 ,室温下制备的B4C薄膜具有很高的硬度 ( 4 2 5GPa)和杨氏模量 ( 3 0 0GPa) ,薄膜呈现非晶或纳米晶特征。随基片温度的提高 ,薄膜略有晶化 ,硬度与杨氏模量相应增加到5 0 4GPa和 4 2 0GPa。

B 4C films,grown by multi target magnetron sputtering at different substrate temperatures,were studied with Fourier transform infrared spectroscopy,X ray diffraction,transmission electron microscopy to characterize its microstructures.Mechanical properties were evaluated with a nanoindenter.The results show that B 4C film,grown at room temperature may be amorphous or nano crystalline with a high hardness of 42.5 GPa and a Young′s modulus of 300 GPa.With the increase of substrate temperature,B 4C film tends to slightly recrystallize,and its hardness and Young′s modulus go up to 50.4 GPa and 420 GPa,respectively.