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烷/炔气低温沉积TiC黑膜的研究 被引量:5

Study on TiC black film by low temperature deposition with alkane/alkyne gas
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摘要 研究输入 C2 H2 +C3H8+Ar+N2 混合气的低温沉积 Ti C涂层真空阴极电弧离子镀技术 ,研究结果表明 :Ti C涂层层深 0 .0 0 5~ 0 .0 0 2 5 m m,涂层硬度 2 80 0~ 35 0 0 Hv0 .0 2 ,主要用于材料表面工程中耐磨。 It is researched on low temperature deposition TiC coating of vacuum cathode arc ion plating technique by the method to import C 2H 2+C 3H 8+Ar+N 2 mixture gases. The results of research show that the depth of TiC coating is 0.0005~0.0025 mm ,the hardness is 2800~3500 Hv 0.02 , the technology can be used to the coating of the wear resistance, corrosion resistance and decoration in the surface material engineering.
作者 张海军
出处 《真空》 CAS 北大核心 2001年第6期17-19,共3页 Vacuum
关键词 真空阴极电弧离子镀 低温沉积 TiC黑膜 金属材料 表面处理 碳化钛涂层 丙烷气 乙炔气 vacuum cathode arc ion plating low temperature deposition TiC black film
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