偏压对磁控溅射沉积Al-Zn镀层成分和结构的影响

Influence of substrate bias on the composition and structure of sputtered Al-Zn coating

采用扫描电镜 (SEM)、X射线衍射仪、X射线能谱 (EDS)和俄歇电子能谱仪 (AES) ,研究了基片偏压对磁控溅射沉积 Al- Zn镀层组成和结构的影响。随着基片偏压的增加镀层的 Zn含量呈降低趋势 ,在不同基片偏压下可获得不同择优取向的 Al-

The coatings were sputtered from target of Al Zn alloys onto steel substrates, over a different of bias voltages. The composition, structure, and morphology of coatings were characterised by energy dispersive X-ray spectrometry, X ray diffraction, Auger electron spectroscopy, and scanning electron microscopy respectively. The composition of the deposited films were highly dependent on the substrate bias. During the growth of the coatings energetic ion bombardment significantly affected the coatings prefered orientation.