摘要
一种新型的 MOCVD(Mettalic Organism CVD)装置 ,既金属有机化合物 CVD沉积装置。该装置具有结构简单 ,在低温、低压条件下能够实现化学气相沉积反应。气路系统全部采用进口零部件 ,保证反应气体的纯度。等离子体在反应过程中起到辅助和掺杂的作用。经实验表明该装置能够较好地完成氧化锌薄膜的研究工作 。
A type of MOCVD equipment, e.g CVD plant for metal origanic comound is given in the paper. Its structure is simple, it can be used to carry out the CVD reaction in the low temperature and pressure. The parts of air conduit system are the imported, the purity of reactive gasses can be kept. Plasma has the auxiliary and doping action in the reactive process. Research on ZnO film can be done with the equipment, the neccessary conditions can also be provided.
出处
《真空》
CAS
北大核心
2001年第6期23-25,共3页
Vacuum
